BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//EFDS - ECPv6.17.4.1//NONSGML v1.0//EN
CALSCALE:GREGORIAN
METHOD:PUBLISH
X-ORIGINAL-URL:https://efds.org
X-WR-CALDESC:Veranstaltungen für EFDS
REFRESH-INTERVAL;VALUE=DURATION:PT1H
X-Robots-Tag:noindex
X-PUBLISHED-TTL:PT1H
BEGIN:VTIMEZONE
TZID:Europe/Berlin
BEGIN:DAYLIGHT
TZOFFSETFROM:+0100
TZOFFSETTO:+0200
TZNAME:CEST
DTSTART:20260329T010000
END:DAYLIGHT
BEGIN:STANDARD
TZOFFSETFROM:+0200
TZOFFSETTO:+0100
TZNAME:CET
DTSTART:20261025T010000
END:STANDARD
BEGIN:DAYLIGHT
TZOFFSETFROM:+0100
TZOFFSETTO:+0200
TZNAME:CEST
DTSTART:20270328T010000
END:DAYLIGHT
BEGIN:STANDARD
TZOFFSETFROM:+0200
TZOFFSETTO:+0100
TZNAME:CET
DTSTART:20271031T010000
END:STANDARD
BEGIN:DAYLIGHT
TZOFFSETFROM:+0100
TZOFFSETTO:+0200
TZNAME:CEST
DTSTART:20280326T010000
END:DAYLIGHT
BEGIN:STANDARD
TZOFFSETFROM:+0200
TZOFFSETTO:+0100
TZNAME:CET
DTSTART:20281029T010000
END:STANDARD
END:VTIMEZONE
BEGIN:VEVENT
DTSTART;VALUE=DATE:20270315
DTEND;VALUE=DATE:20270318
DTSTAMP:20260915T121820Z
CREATED:20260327T091052Z
LAST-MODIFIED:20260915T121820Z
UID:10000267-1805068800-1805327999@efds.org
SUMMARY:ALD for Industry 2027
DESCRIPTION:The 10th International Conference „ALD FOR INDUSTRY“ will bridge the gap between fundamental science\, industrialization and commercialization of this technology. Atomic layer deposition (ALD) is a process for depositing a variety of thin film materials from the vapor phase of matter. The conference topics range from developments and trends of the coating technology and the ALD equipment to applications in the semiconductor industry\, power devices\, advanced packaging\, sensors and energy technologies. \nAt the conference recent developments for ALD processes\, simulation and characterization of coatings and coating processes\, precursor materials\, ALD systems and coatings for special applications are presented. Beside the Conference\, you will have the chance to meet industrial experts and get informed about new materials\, coating systems\, measurement technology for quality management and suitable equipment in the exhibition. During the tutorials basic knowledge will be refreshed or extended with new insights and basic process understanding. \nThis event is already established since 2016 and attracts annually more than 100 participants and numerous exhibitors to visit Dresden. Get informed about recent progress in the field and to get in contact with industrial and academic partners. Increase your visibility and present your company in our accompanying exhibition. The next event will take place on March 16 – 17\, 2027 in Dresden\, Germany. Please\, do not miss the chance to submit your abstract to present your recent research in the field of ALD\, show application examples or present accompanying technologies like metrology\, combinations of technological approaches like plasma technology or vacuum technologies. \nALD for Industry | Overview & General Information [PDF] \nAbstract Submission \nTemplate for Abstract [PDF] \nAbstract Submission Deadline for Oral Presentations: September 15\, 2026\nAbstract Submission Deadline for Poster Presentations: January 31\, 2027 \n\n\n\nTicket\nPrice*\n\n\nStandard ticket | early bird\n830 EUR\n\n\nStandard ticket | after January 31\, 2027\n930 EUR\n\n\nOne Day ticket | early Bird\n540 EUR\n\n\nOne Day ticket | after January 31\, 2027\n640 EUR\n\n\nStudent ticket / Student Poster\n420 EUR\n\n\nPoster Presenters\n730 EUR\n\n\nSpeakers\n420 EUR\n\n\nCommittee\, Invited & Keynote Speakers\nfree of charge\n\n\n\n*workshop fees are free of VAT according to §4 (22a) UStG (German value-added tax law) \nProgram Preview – For Travel Planing \nMonday\, March 15\, 2027 | 16:00 – 22:00 | Tours & Anniversary Dinner \nTuesday\, March 16\, 2027 | 08:00 – 22:00 | Exhibition Construction\, Conference\, Poster Session\, Industrial Evening \nWednesday\, March 17\, 2027 | 09:00 – 16:30 | Conference & Exhibition \nInternational Program Committee \n\nAdriana Creatore\, University Eindhoven\, Netherlands\nElina Färm\, ASM\, Finland\nGloria Gottardi\, Fondazione Bruno Kessler\, Italy\nMartin Knaut\, TU Dresden\, Germany\nHarm Knoops\, University Eindhoven & Oxford Instruments Plasma Technology\, Netherlands\nLie Luo\, Beneq Oy\, Finland\nHarish Parala\, Leibniz IFW\, Germany\nFred Roozeboom\, University Twente\, Netherlands\nDmitry Suyatin\, AlixLabs\, Sweden\n\nExhibition & Sponsors \n\n\n\n\nGold Sponsor\nPlatinum Sponsor\n\n\nLogo @ event website\nX\nX\n\n\nLogo @ front page of printed program booklet\n\nX\n\n\nAdvertisement in the\nprinted program booklet\nHalf page\nFull page\n\n\n1 table in the exhibition\nX\nX\n\n\n1 person free of charge\nX\nX\n\n\nA presentation slot (10 min advertisement)\n\nX\n\n\nPrice without VAT\n2.200 EUR\n2.700 EUR\n\n\n\nBooking Form Sponsors [PDF] \nHotel Recommendation \nHotel recommendation ALD2027 [PDF]
URL:https://efds.org/event/ald-for-industry-2027/
ORGANIZER;CN="European Society of Thin Films":MAILTO:info@efds.org
END:VEVENT
END:VCALENDAR