{"id":30214,"date":"2022-11-11T13:59:14","date_gmt":"2022-11-11T12:59:14","guid":{"rendered":"https:\/\/efds.org\/event\/international-conference-ald-for-industry\/"},"modified":"2023-03-20T11:31:51","modified_gmt":"2023-03-20T10:31:51","slug":"international-conference-ald-for-industry","status":"publish","type":"tribe_events","link":"https:\/\/efds.org\/en\/event\/international-conference-ald-for-industry\/","title":{"rendered":"International Conference: ALD for industry"},"content":{"rendered":"

The 6th International Conference \u201eALD FOR INDUSTRY\u201c will again show the bridge between basic science, industrialisation and commercialisation<\/strong> of this technology.<\/p>\n

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The Global Atomic Layer Deposition ALD Equipment Market Size was estimated at USD 1296.62 million in 2021 and is projected to reach USD 6744.66 million by 2028, exhibiting a CAGR of 26.56% during the forecast period. The growth of this technology is not only based in microelectronics applications, but also in areas of industrial Li-Ion batteries, photovoltaics and quantum technology. Atomic layer deposition, is a thin film technology that enables new and highly innovative products for a wide range of applications.<\/p>\n

In 2023 the EFDS will organize the 6th workshop \u201eALD FOR INDUSTRY\u201c in Dresden (Germany), at one of the focal points of European thin-film technologies in industrial applications and research. \u201eALD for industry provides the opportunity to get in touch with industrial and academic partners, to learn more about fundamentals and potential application of ALD technology<\/p>\n

The Workshop will focus on the currents markets for ALD and address the applications in Semiconductor industry, MEMS &Sensors, Battery technology, Medical, Display, Lightning and Photovoltaics.<\/p>\n

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DETAILED INFORMATION DOWNLOAD
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Conference Program<\/a><\/p>\n

Information for exhibitors<\/a><\/p>\n

PROGRAM COMMITTEE<\/strong><\/p>\n

Jamie Greer, Air Liquide Advanced Materials, Paris, France
\nDr. Christoph Hossbach, Picosun Oy and Picosun Europe GmbH, Dresden, Germany
\nDr. Martin Knaut, IHM, TU Dresden, Germany
\nProf. Mikko Ritala, University of Helsinki, Helsinki, Finland
\nDr. Jonas Sundqvist, TECHCET LLC CA, Lund, Sweden
\nDr. Claudia Wiemer, CNR IMM, Unit of Agrate Brianza, Italy<\/p>\n

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\"\"<\/a>This event is supported by EPIC<\/a> \u2013 European Photonics Industry Consortium<\/p>\n

Platinum Sponsors<\/h3>