The 10th International Conference \u201eALD FOR INDUSTRY\u201c will bridge the gap between fundamental science, industrialization and commercialization of this technology. Atomic layer deposition (ALD) is a process for depositing a variety of thin film materials from the vapor phase of matter. The conference topics range from developments and trends of the coating technology and the ALD equipment to applications in the semiconductor industry, power devices, advanced packaging, sensors and energy technologies.<\/p>\n
At the conference<\/b> recent developments for ALD processes, simulation and characterization of coatings and coating processes, precursor materials, ALD systems and coatings for special applications are presented. Beside the Conference, you will have the chance to meet industrial experts and get informed about new materials, coating systems, measurement technology for quality management and suitable equipment in the exhibition<\/b>. During the tutorials<\/b> basic knowledge will be refreshed or extended with new insights and basic process understanding.<\/p>\n
This event is already established since 2016 and attracts annually more than 100 participants and numerous exhibitors to visit Dresden. Get informed about recent progress in the field and to get in contact with industrial and academic partners. Increase your visibility and present your company in our accompanying exhibition. The next event will take place on March 16 \u2013 17, 2027 in Dresden, Germany<\/b>. Please, do not miss the chance to submit your abstract to present your recent research in the field of ALD, show application examples or present accompanying technologies like metrology, combinations of technological approaches like plasma technology or vacuum technologies.<\/p>\n
Template for Abstract [PDF]<\/a><\/p>\n Abstract Submission Deadline for Oral Presentations: September 15, 2026 The 10th International Conference \u201eALD FOR INDUSTRY\u201c will bridge the gap between fundamental science, industrialization and commercialization of this technology. Atomic layer deposition (ALD) is a process for depositing a variety of thin film materials Continue Reading<\/a><\/p>\n","protected":false},"author":7,"featured_media":0,"template":"","meta":{"_acf_changed":false,"_tribe_events_status":"","_tribe_events_status_reason":"","_tribe_events_is_hybrid":"","_tribe_events_is_virtual":"","_tribe_events_virtual_video_source":"","_tribe_events_virtual_embed_video":"","_tribe_events_virtual_linked_button_text":"","_tribe_events_virtual_linked_button":"","_tribe_events_virtual_show_embed_at":"","_tribe_events_virtual_show_embed_to":[],"_tribe_events_virtual_show_on_event":"","_tribe_events_virtual_show_on_views":"","_tribe_events_virtual_url":"","footnotes":""},"tags":[],"tribe_events_cat":[],"class_list":["post-51792","tribe_events","type-tribe_events","status-publish","hentry","post-holder"],"acf":[],"_links":{"self":[{"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/tribe_events\/51792","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/tribe_events"}],"about":[{"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/types\/tribe_events"}],"author":[{"embeddable":true,"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/users\/7"}],"version-history":[{"count":1,"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/tribe_events\/51792\/revisions"}],"predecessor-version":[{"id":51794,"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/tribe_events\/51792\/revisions\/51794"}],"wp:attachment":[{"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/media?parent=51792"}],"wp:term":[{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/tags?post=51792"},{"taxonomy":"tribe_events_cat","embeddable":true,"href":"https:\/\/efds.org\/en\/wp-json\/wp\/v2\/tribe_events_cat?post=51792"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}
\nAbstract Submission Deadline for Poster Presentations: January 31, 2027<\/p>\n","protected":false},"excerpt":{"rendered":"