Plasma technologies for surface modification and layer deposition are industrially established and many products in semiconductor technology, the automotive industry, medical technology, etc. are no longer conceivable today without technological plasma processes.
Specific process control is essential to ensure process reliability when using plasma technology. Continuous further development of the relevant diagnostics is required to optimize and ultimately reduce the costs of production processes.
The workshop “Stable Control and efficient design of industrial plasma processes with plasma diagnostics” is dedicated to this topic. Renowned experts from research institutions will be presented basic insights as well as new innovative aspects for a stable process control. While Industrial partners will be demonstrated the implementation of well established tools by some impressive examples. Simple methods that are well suited for industrial use will also be presented. But also very specialized diagnostic procedures and new possibilities by using artificial intelligence will be addressed.
The Workshop is planned for:
Program Outlook
Poster Presentations and Sponsoring
PO001
Virtual Metrology for reduced representation of spatially resolved etching depth in Bosch Process
Aditya Deshmukh, Fraunhofer ENAS, TU Freiberg, Germany
PO002
Probe measurement technology MRP used in pulsed plasma processes
Moritz Oberberg, House of Plasma, Germany
PO003
PlasmaMon – a development tool for plasma technique and plasma technology
Herrmann Schlemm, Jenion, Germany
You want to present your work to an international community? Send your poster to be presented at this event.
Abstract Termplate [PDF]
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Booking Form for Sponsoring [PDF]
Europäische Forschungsgesellschaft Dünne Schichten e.V.
Gostritzer Straße 63
01217 Dresden, GERMANY
