Project duration: 01.01.2018 – 31.08.2020
The research objective is the pre-competitive development of a plasma process for the deposition of adhesion-resistant materials,
photocatalytically active TiO2 layers by means of high-performance pulse magnetron sputtering (HiPIMS) in combination with the
plasma-based ion implantation (PBII).
Here, the TiO2 layer is deposited by means of HiPIMS and is then protected by ion implantation (PBII).
be technologically complemented. Thus, (I) both a targeted doping of the TiO2 layers with foreign atoms and
This makes excitation in the visible spectral range possible and (II) the setting of an antibacterial effect for
Use of the doping elements Cu, Ag or Zn. The layer adhesion is achieved by the combination process on the
different substrates is significantly increased.
Through targeted parameter variation, the layer properties desired by the users are set by
an application-specific balance between photoinduced catalysis and photoinduced hydrophilicity is realised.
The requirements of potential users for the functional layer depend on the respective industry.
Implant manufacturers, for example, benefit from the photo-induced hydrophilicity of the coatings by increased
Wettability of the implant and thus improved healing. For users of sterile technology, the active
disinfection of the surface through photo-induced catalysis. The food industry in turn
hopes to shorten the required cleaning cycles and thus save considerable costs.
Research positions/project leaders:
Prof. Liefeith; iba e.V., Heilbad Heiligenstadt
Dr. Fricke; INP, Greifswald
Project Monitoring Committee:
INI Coatings Ltd.
Berief Nahrungsmittelmaschinen GmbH & Co. KG
4-H Jena Engineering GmbH
NTTF Coatings GmbH Nuclear Technology & Thin Films
scia Systems GmbH
FAP Forschungs-u. Applikationslabor Plasmatechnik GmbH Dresden
Berner International GmbH
Jürgen Löhrke GmbH
Mathys Orthopädie GmbH
senetics healthcare group GmbH & Co. KG
Margurit Gefrierschneider GmbH
Closing report [PDF]