ALD for Industry 2025

The 8th International Conference “ALD FOR INDUSTRY” will again bridge the gap between fundamental science, industrialization and commercialization of this technology. Atomic layer deposition (ALD) is a process for depositing a variety of thin film materials from the vapor phase of matter. The growth of this technology is not only based in microelectronics applications, but also in areas of industrial Li-Ion batteries, photovoltaics, optics, light, biomedicine and quantum technology.

This event is already establied since 2017 and attracts annually more than 100 participants and numerous exhibitors to visit Dresden. The Conference with Tutorial provides the opportunity to learn more about fundamentals of ALD technology, to get informed about recent progress in the field and to get in contact with industrial and academic partners. Increase your visibility and present your company in our accompanying exhibition.

The next event will take place in March 11 – 12, 2025 in Dresden. Please do not miss the chance to submit your abstract to present your recent research in the field of ALD, show application examples or present accompanying technologies like metrology, combinations of technological approaches like plasma technology or vacuum technologies.

• General Information File [PDF]
• Template Abstract ALD for Industry 2025 [PDF]
• Hotel Recommendations [PDF]
  

Program Preview

We are pleased to announce first speakers of the upcoming event. A complete porgram will be published in January 2025

• Fundamentals of atomic layer deposition: a tutorial| Riikka Puurunen, Aalto University, Sweden
• Industrial batch ALD for optical applications | Shuo Li, Afly Solution Oy, Finland
• Direct Processing by µDALP™. Precision Coatings for Next Gen Devices | Maksym Plakhotnyuk, ATLANT 3D, Denmark
• Nanoscale solid-state lithium-ion electrolytes enabled by atomic layer deposition | Messaoud Bedjaoui, CEA Leti, France
• Fabrication of Surface Relief Gratings using ALD-based Technologies to Overcome the Challenges of Reactive Ion Etching of TiO2 | Mathias Franz, Fraunhofer ENAS, Germany
• Monitoring and optimisation of ALD processes with Remote Plasma Optical Emission Spectroscopy | Erik Cox, Gencoa Ltd, UK
• Optimizing Plasma-Assisted Atomic Layer Deposition using Impedans RFEAs | Angus McCarter, Impedans Ltd., UK
• Improving atomic layer deposition process of silicon oxide (SiO2) and aluminum oxide (Al2O3) | Long Lei, Fraunhofer IMPS, Germany
• Introducing a Surface Acoustic Wave-Based Miniaturized Aerosol Source for Controlled Liquid Precursor Delivery in ALD Processes | Mehrzad Roudini, Leibniz IFW, Germany
• Challenges and Solutions in ALD of Thermal Budget Sensitive Ferroelectric Materials | Bart Vermeulen, Ferroelectric Memory Co GmbH, Germany
• ALD for Nanoparticles: From Fundamentals to Industrial Applications | Rong Chen, University of Science and Technology HUST, China
• Recent developments and emerging applications in atmospheric-pressure ALD on high-porosity membranes | Fred Roozeboom, University of Twente, Netherlands
• Past, present and future of ALD from an industrial perspective | Jan Willem Maes, ASM, Belgium
• Advanced in-situ QCM process monitoring | Martin Knaut, ALS Metrology UG, Germany
• Cryogenic Atomic Layer Etching (Cryo-ALE) of low-k dielectrics like SiO2, and GaN etching. | Rémi Dussart, Université d´Orleans, France

Program Committee

• Sean Barry, Carleton University, Canada
• Gloria Gottardi, Fondazione Bruno Kessler, Italy
• Christoph Hossbach, Applied Materials / Picosun Europe, Germany
• Martin Knaut, TU Dresden, Germany
• Laura Nyns, IMEC, Belgium
• Fred Roozeboom, University Twente, Netherlands
• Jonas Sundqvist, Alixlabs, Sweden

POSTER Exhibition

The Poster Submission is open until January 31, 2025. Please send us an Abstract for your Poster Application. PO001 | Deposition of High Quality Aluminium Fluoride Layers through Optimization of a PEALD Process using Al(CH3)3 and SF6 | Fabian Steger, RhySearch, Buchs, Austria

Accompanying Exhibition and Sponsoring

This Conference provides the opportunity to present your company or institute at the accompanying exhibition. You want to present your products and services at the exhibition? Please register as Sponsor with included Conference Ticket. The exhibition will be included in the conference hall directly at the event. For further details, please discover the Sponsoring Offer [PDF]
Please register using the registration form [PDF] Exhibition List:

• Beneq, Finland
• Sempa Systems GmbH, Germany
• Epivalence Limited, United Kingdom

We are pleased about the support of our MAIN SPONSOR 2025. Thank you!