01.09.2017 – 29.02.2020

In the project, a common digital twin was created for PVD and PECVD coating processes, which describes both the process and the layer growth dynamics. The complementary software tools existing at the project partners were further developed and validated demonstration cases were worked out at various coating plants. The advanced tools can be used for industrial simulation studies.

Research centres
Fraunhofer IST, Braunschweig, Germany
Laser Zentrum Hannover, Hanover, Germany
Université de Namur, Namur, Belgium
CRM Group, Lüttich, Belgium

Project Monitoring Committee:
asphericon GmbH
Schneider GmbH & Co. KG
W+L Coating Systems GmbH
VON ARDENNE GmbH
robeko GmbH & Co. KG
Laser Components GmbH
INTERPANE Entwicklungs- und Beratungsgesellschaft mbH
Cutting Edge Coatings GmbH

Publication

Closing report [PDF]

[Badorreck 2019]:
Badorreck, H.; Steinecke, M.; Jensen, L.; Ristau, D.; Jupé, M.; Müller, J.; Tonneau, R.; Moskovkin, P.; Lucas, S.; Pflug, A.; Grineviciūtė, L.; Selskis, A. & Tolenis, T.: Correlation of structural and optical properties using virtual materials analysis. In: Optics Express 27 (2019), Nr. 16, S. 22209

[Pflug 2019]:
Pflug, A.; Bruns, S.; Zickenrott, T.; Britze, C.; Vergöhl, M. & Kirschner, V.: Plasma and process modelling for PVD deposition onto moving 3D substrates. In: Proceedings of the 15th ISSP., Kanazawa, JP (2019).

[Schwerdtner 2020]:
Schwerdtner, P.: Ortsaufgelöste Untersuchung der optischen Eigenschaften von Tantalpentoxid-Schichten im IBS-Beschichtungsverfahren, Bericht, Universität Hannover, Masterarbeit, Universität Hannover, 2020, S. 101

[Tonneau 2020]:
Tonneau, R.; Pflug, A. & Lucas, S.: Magnetron sputtering: determining scaling relations towards real power discharges using 3D Particle-In-Cell Monte Carlo models. In: Plasma Sources Science and Technology (2020)

[Tonneau 2021]:
Tonneau, R.; Moskovkin, P.; Muller, J.; Melzig, T.; Haye, E.; Konstantinidis, S.; Pflug, A. & Lucas, S.: Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition. In: Journal of Physics D: Applied Physics 54 (2021), Nr. 15, S. 155203